Spatial profile of Al-ZnO thin film on polycarbonate deposited by ring-shaped magnetized rf plasma sputtering with two facing cylindrical Al₂O₃ – ZnO targets

Abstract Radial profiles of the ion saturation current are measured in a ring-shaped magnetized radio-frequency plasma sputtering process with two facing cylindrical ZnO targets including Al 2 O 3 (2% wt.). The profile has non-uniform shape peak whose position corresponds to target near electrode due effect magnetic field distribution. It becomes uniform at large distances between substrate and ( d st ≥ 50 mm). radial resistivity Al-ZnO (AZO) films deposited on polycarbonate plate Ar gas pressure 0.27 Pa is about 10 −3 Ω · cm for mm. various positions room-substrate-temperature also show good crystallinity based an X-ray diffraction 33.95–34.44°. grains exhibit preferential orientation along [002] axis its size ranging from 18.15 28.17 nm. A higher transmittance 95.6% visible region obtained.